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  • Erbium Sputtering Target

    Premium Erbium Sputtering Target Supplier

    AEM REE specializes in producing high-purity erbium sputtering targets designed for advanced material deposition processes. Our products feature excellent uniformity, density, and purity, ensuring reliable performance in thin film fabrication and research environments.

    With years of experience, we provide customizable erbium sputtering targets to meet diverse technical requirements. Each target is manufactured under strict quality control standards, guaranteeing stable composition, superior consistency, and outstanding surface finish.

    Erbium Sputtering Target Specifications

    Purity: Er/TREM≥99.99% TREM≥99.9%
    Average Grain Size: <200μm
    Surface Roughness: <2μm
    Shapes: Square target, circular target, rotating target

    Our Erbium Product Advantages

    • Strict Quality Control Throughout the Entire Production Process
    • High-Purity Erbium Targets with ≥99.9% Guaranteed Purity
    • Fully Customizable Specifications to Match Your Unique Needs
    • Advanced Manufacturing Equipment Ensuring Consistent Quality
    • Comprehensive Testing and Analytical Capabilities
    • Global Delivery Network and Responsive Customer Service
    Get a Quote for High-Quality Erbium Metal
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    Unique Properties of Erbium Sputtering Target

    Erbium sputtering targets are known for their exceptional purity, structural integrity, and stable performance, offering superior material characteristics that ensure efficient, clean, and uniform thin film deposition in demanding environments.

    1. High Density and Compact Microstructure

    The erbium sputtering target features a high-density structure that minimizes voids and defects, ensuring smooth material transfer during the sputtering process and improving coating adhesion and uniformity.

    2. Low Particle Generation for Clean Deposition

    With precisely controlled surface preparation and purity, the target generates very few particles during sputtering, reducing contamination and improving the quality of the deposited thin films.

    3. Uniform Film Thickness Distribution

    Excellent material homogeneity and balanced sputtering performance lead to even material erosion, resulting in films with uniform thickness and consistent optical and electrical properties.

    4. High Melting Point and Excellent Thermal Stability

    Erbium has a melting point of about 1529°C, allowing the target to maintain stability under high sputtering power and temperature conditions without deformation or degradation.

    5. Excellent Mechanical Strength and Durability

    The refined processing and dense structure provide the target with high mechanical strength, enabling long service life and consistent sputtering performance.

    6. Strong Chemical Stability and Resistance to Oxidation

    Erbium's inherent chemical resistance protects the target from oxidation and contamination during storage and operation, ensuring long-term reliability.

     

    Manufacturing Process of Erbium Sputtering Target

    High-purity erbium metal is melted and atomized into fine spherical powders, forming the base of target density and uniformity. The powders are then sieved to achieve optimal particle size distribution and thoroughly mixed to ensure consistent composition and homogeneity before compaction.

    The prepared powder is compacted into a "green body" using a hydraulic press or cold isostatic pressing (CIP) equipment. This process forms a solid pre-sintered shape with sufficient mechanical strength for handling and further processing.

    The green compact undergoes high-temperature sintering in a vacuum furnace. During this stage, the erbium particles bond together, porosity decreases, and the structure begins to densify, forming a strong and cohesive target body.

    The sintered body is treated under high temperature and isostatic gas pressure to eliminate residual pores and enhance mechanical strength, density, and microstructural uniformity, resulting in a fully dense and stable target.

    The densified target is precisely machined by CNC equipment into the required dimensions and shapes. Both sides are then finely ground and polished to achieve excellent flatness and surface finish, meeting sputtering equipment standards.

    To remove residual stress caused by sintering and machining, the target is annealed in a vacuum environment. This step stabilizes the crystal structure and ensures consistent performance during sputtering operations.

    Each erbium sputtering target undergoes strict quality testing, including density measurement, purity analysis, and surface inspection. Only products that fully meet technical and quality standards are carefully packaged for shipment.

    Mixing Machine

    Sintering Furnace

    Die Forging

    Annealing Furnace

    Cold Rolling Mill

    Straightening Machine

    CNC Deep Hole Drilling Machine

    Grinding Machine

    Wire Drawing Equipment

    Wire Cutting Machine

    Handheld XRF Analyzer

    Scanning Electron Microscope

    Erbium Sputtering Target Applications

    Optical Coatings and Laser Devices

    Erbium sputtering targets are widely used in the deposition of thin films for optical components such as laser mirrors, filters, and amplifiers. Due to erbium's ability to emit and absorb light near 1550 nm, the produced coatings are essential for high-performance optical systems and infrared laser technologies.

     

     

    Telecommunications and Fiber Optic Amplifiers

    Erbium sputtering targets are used to create erbium-doped films that serve as the active medium in optical amplifiers. These films enable the amplification of light signals in long-distance networks, improving data transmission efficiency and signal strength without electrical conversion.

     

     

     

    Phosphors and Luminescent Thin Films

    Erbium sputtering targets are used to deposit luminescent materials for display screens and LED technologies. Their strong emission in the visible and near-infrared ranges allows for vivid color generation and improved brightness, making them ideal for advanced display systems and optical sensors.

     

     

    Thin Film Transistors and Electronic Devices

    In the electronics field, erbium sputtering targets are applied to produce thin films for transistors and semiconductor components. These erbium films enhance the electrical stability, conductivity, and dielectric performance of devices, contributing to miniaturization and high-efficiency electronics.

     

     

    High-Temperature Superconducting Materials

    Erbium sputtering targets are used in the fabrication of thin films for high-temperature superconductors. When incorporated into superconducting materials, erbium improves flux pinning and enhances their electrical properties, helping develop next-generation superconducting technologies.

     

     

    Infrared-Absorbing and Thermal Control Materials

    Erbium sputtering targets are used to deposit coatings with strong infrared absorption and reflection characteristics. These coatings are applied to optical windows, sensors, and protective lenses to control heat transfer and enhance performance in thermal imaging systems, aerospace optics, and environmental monitoring instruments.

     

     

    Glass and Ceramic Coloration Coatings

    Erbium sputtering targets are employed to produce decorative and functional coatings on glass and ceramic surfaces. The deposited erbium layers impart a distinctive pink hue and improve optical clarity, making them ideal for specialty architectural glass, artistic ceramics, and high-end optical display materials.

     

     

    Scientific Research and Material Development

    Erbium sputtering targets are extensively used in universities and research institutes for experimental studies. Researchers use them to explore new erbium-based materials, study thin film behaviors, and develop novel optical, electronic, and magnetic materials for emerging technologies.

     

     

     

     

     

     

    Other Erbium Products We Offer

    Our Satisfied Customers

    We serve clients across wide range of Industries like Educational Institutes and Universities, Research Laboratories, and many Industrial Manufacturers. With our commitment to delivering premium erbium metal, our clients are always happy with our products and services, making their experience a great one every time.

     

    Contact us Today

    Solution about erbium Metal? Our experts are here to help. Contact us for advice on choosing and using erbium. Get a quote now or let us know what you're looking for and we will get back to you soon!

    Room 1725-1729, Building C3, Forte Binjiang Financial Center, No. 751 Xiaoxiang North Road, Yuelu District, Changsha, Hunan 410023, China.

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