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High-purity neodymium ingot is produced using vacuum induction melting (VIM) or electron beam melting (EBM). Each batch is analyzed using GDMS and ICP-MS to ensure purity, chemical consistency, and low impurity levels before processing.
The slabs are hot-forged or hot-rolled to increase density and refine the grain structure. This process removes internal voids and ensures mechanical strength and uniform sputtering behavior.
Targets are precisely machined to meet tight tolerances in thickness, diameter, and flatness, ensuring compatibility with various sputtering systems and stable film deposition.
Final surface finishing and polishing reduce surface roughness to below 2 μm, creating a clean, oxide-free surface that improves sputtering efficiency and film uniformity.
For sputtering systems that require backing plates, neodymium targets can be bonded to copper or molybdenum using indium soldering or diffusion bonding to improve heat transfer and durability.
Each target is inspected for dimensions, flatness, grain structure, and surface quality before shipment. Approved products are vacuum-sealed with desiccant or argon-filled, and each order includes a Certificate of Analysis (COA) and full quality documentation.
