Holmium Sputtering Target

The refined holmium powder is compacted into a solid preform using cold isostatic pressing (CIP) or hydraulic pressing technology. This forms a uniform "green body" with the desired shape and sufficient strength for sintering, ensuring even density throughout the target.

The pressed holmium preform is sintered in a high-temperature vacuum furnace, where the powder particles fuse together to form a dense, homogeneous structure. Vacuum sintering minimizes oxidation and contamination, resulting in a target with superior purity and bonding strength.

The sintered body is further densified through hot isostatic pressing under high temperature and pressure. This process removes internal pores, enhances mechanical stability, and ensures excellent uniformity and adhesion properties for thin-film deposition.

After densification, the holmium target is precisely machined by CNC equipment to achieve tight dimensional tolerances. Both surfaces are ground and polished to a smooth, mirror-like finish, ensuring optimal surface flatness, minimal defects, and consistent sputtering performance.

A final vacuum annealing treatment is performed to relieve residual stresses introduced during machining and improve the stability of the target structure. This step enhances thermal conductivity and ensures steady sputtering behavior under prolonged operation.

Each holmium sputtering target undergoes strict inspection for density, grain size, surface finish, and chemical composition. Non-destructive testing and dimensional checks confirm that every product meets stringent technical and performance standards. Then the finished targets are carefully packaged to prevent moisture and contamination during storage and transport.